主要特点：

刻蚀用托盘采用高纯无压烧结碳化硅陶瓷材料，具有硬度高，耐腐蚀、耐磨损，使用寿命长等特点，并且产品精度高、晶圆外延层刻蚀均匀性好。

Main features

The tray used for etching is made of high purity sintered silicon carbide ceramics without pressure.It has the characteristics of high hardness, corrosion resistance, wear resistance, long service life, high precision and good etching uniformity of wafer epitaxy layer.

应用领域：

应用于LED 晶圆芯片的外延层薄膜材料（GaN、SiO2 等）的ICP 刻蚀制程、半导体扩散用精密陶瓷零件及半导体晶圆的MOCVD 外延制程。

Application

ICP etching process of epitaxial film materials(GaN, SiO 2, etc.) for LED wafer chips, precision ceramic parts for semiconductor diffusion and MOCVD epitaxy process for semiconductor wafers.

规格型号：

我公司可按照客户的需求提供相应陶瓷托盘产品，直径范围：Φ50~500mm。托盘盘厚度：3~20mm，并且可以根据客户的要求进行设计和制造各种非标产品。

Specification:

Our company can provide the corresponding ceramic tray products according to the customer's needs, diameter range: 50~500mm. thickness:3~20mm, and can be designed and manufactured according to customer requirements of various non-standard products.